Combination of Multiple Operando and In-Situ Characterization Techniques in a Single Cluster System for Atomic Layer Deposition: Unraveling the Early Stages of Growth of Ultrathin Al2O3 Films on Metallic Ti Substrates

Description

Toolbox-ID

jz000076-0467

Identifier(s)

https://tustorage.ulb.tu-darmstadt.de/handle/tustorage/4980

Publisher

MDPI AG

License

https://creativecommons.org/licenses/by/4.0/

Subject(s)

DDC(s)

540

Distribution(s)

Distribution
Combination of Multiple Operando and In-Situ Characterization Techniques in a Single Cluster System for Atomic Layer Deposition: Unraveling the Early Stages of Growth of Ultrathin Al2O3 Films on Metallic Ti Substrates
Carlos Morales; Ali Mahmoodinezhad; Rudi Tschammer; Julia Kosto; Carlos Alvarado Chavarin; Markus Andreas Schubert; Christian Wenger; Karsten Henkel; Jan Ingo Flege
Distribution
Combination of Multiple Operando and In-Situ Characterization Techniques in a Single Cluster System for Atomic Layer Deposition: Unraveling the Early Stages of Growth of Ultrathin Al2O3 Films on Metallic Ti Substrates
Carlos Morales; Ali Mahmoodinezhad; Rudi Tschammer; Julia Kosto; Carlos Alvarado Chavarin; Markus Andreas Schubert; Christian Wenger; Karsten Henkel; Jan Ingo Flege