Combination of Multiple Operando and In-Situ Characterization Techniques in a Single Cluster System for Atomic Layer Deposition: Unraveling the Early Stages of Growth of Ultrathin Al2O3 Films on Metallic Ti Substrates
Description
Toolbox-ID
jz000076-0467
Identifier(s)
https://tustorage.ulb.tu-darmstadt.de/handle/tustorage/4980
Publisher
MDPI AG
License
https://creativecommons.org/licenses/by/4.0/
Subject(s)
DDC(s)
540