Combination of Multiple Operando and In-Situ Characterization Techniques in a Single Cluster System for Atomic Layer Deposition: Unraveling the Early Stages of Growth of Ultrathin Al2O3 Films on Metallic Ti Substrates

Carlos MoralesAli MahmoodinezhadRudi TschammerJulia KostoCarlos Alvarado ChavarinMarkus Andreas SchubertChristian WengerKarsten HenkelJan Ingo Flege2024-08-152024-08-152023jz000076-0467https://tustorage.ulb.tu-darmstadt.de/handle/tustorage/4980540Combination of Multiple Operando and In-Situ Characterization Techniques in a Single Cluster System for Atomic Layer Deposition: Unraveling the Early Stages of Growth of Ultrathin Al2O3 Films on Metallic Ti SubstratesArticlehttps://doi.org/10.3390/inorganics11120477