Combination of Multiple Operando and In-Situ Characterization Techniques in a Single Cluster System for Atomic Layer Deposition: Unraveling the Early Stages of Growth of Ultrathin Al2O3 Films on Metallic Ti Substrates

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dc.contributor.authorCarlos Morales
dc.contributor.authorAli Mahmoodinezhad
dc.contributor.authorRudi Tschammer
dc.contributor.authorJulia Kosto
dc.contributor.authorCarlos Alvarado Chavarin
dc.contributor.authorMarkus Andreas Schubert
dc.contributor.authorChristian Wenger
dc.contributor.authorKarsten Henkel
dc.contributor.authorJan Ingo Flege
dc.date.accessioned2024-08-15T13:12:52Z
dc.date.available2024-08-15T13:12:52Z
dc.identifier.urihttps://tustorage.ulb.tu-darmstadt.de/handle/tustorage/4982
dc.rights.urihttps://creativecommons.org/licenses/by/4.0/
dc.subject.ddc540
dc.titleCombination of Multiple Operando and In-Situ Characterization Techniques in a Single Cluster System for Atomic Layer Deposition: Unraveling the Early Stages of Growth of Ultrathin Al2O3 Films on Metallic Ti Substrates
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