Effect of Doping Different Cu Valence States in HfO2 on Resistive Switching Properties of RRAM

datacite.relatedItem.firstPage85
datacite.relatedItem.issue6
datacite.relatedItem.relatedIdentifierTypeISSN
datacite.relatedItem.relatedItemIdentifier2304-6740
datacite.relatedItem.relationTypeIsPublishedIn
datacite.relatedItem.titleInorganics
datacite.relatedItem.volume10
dc.contributor.authorJin Yang
dc.contributor.authorJun Chen
dc.contributor.authorYingzheng Hong
dc.date.accessioned2024-08-15T14:40:21Z
dc.date.available2024-08-15T14:40:21Z
dc.date.issued2022
dc.identifier.doihttps://doi.org/10.3390/inorganics10060085
dc.identifier.otherjz000075-0240
dc.identifier.urihttps://tustorage.ulb.tu-darmstadt.de/handle/tustorage/8626
dc.publisherMDPI AG
dc.rights.urihttps://creativecommons.org/licenses/by/4.0/
dc.subject.ddc540
dc.titleEffect of Doping Different Cu Valence States in HfO2 on Resistive Switching Properties of RRAM
dc.typeArticle
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