Influence of Efficient Thickness of Antireflection Coating Layer of HfO2 for Crystalline Silicon Solar Cell

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datacite.relatedItem.firstPage171
datacite.relatedItem.issue10
datacite.relatedItem.relatedIdentifierTypeISSN
datacite.relatedItem.relatedItemIdentifier2304-6740
datacite.relatedItem.relationTypeIsPublishedIn
datacite.relatedItem.titleInorganics
datacite.relatedItem.volume10
dc.contributor.authorDeb Kumar Shah
dc.contributor.authorDevendra KC
dc.contributor.authorAhmad Umar
dc.contributor.authorHassan Algadi
dc.contributor.authorMohammad Shaheer Akhtar
dc.contributor.authorO-Bong Yang
dc.date.accessioned2024-08-14T10:24:30Z
dc.date.available2024-08-14T10:24:30Z
dc.date.issued2022
dc.identifier.doihttps://doi.org/10.3390/inorganics10100171
dc.identifier.otherjz000075-0053
dc.identifier.urihttps://tustorage.ulb.tu-darmstadt.de/handle/tustorage/2592
dc.publisherMDPI AG
dc.rights.urihttps://creativecommons.org/licenses/by/4.0/
dc.subject.ddc540
dc.titleInfluence of Efficient Thickness of Antireflection Coating Layer of HfO2 for Crystalline Silicon Solar Cell
dc.typeArticle
dcat.distribution.pdfhttps://tustorage.ulb.tu-darmstadt.de/handle/tustorage/2593
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